Evaluation of average domain size and microstrain in a silicide film by the Williamson-Hall method

Metallurgical and Materials Transactions A: Physical Metallurgy and Materials Science

Volumn 36, Issue 11, 2005, Pages 3187-3194

  Pelleg, Joshua ^a   Elish, E ^a   Mogilyanski, D ^a  

^a BEN GURION UNIVERSITY OF THE NEGEV   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; ANNEALING; CHEMICAL VAPOR DEPOSITION; CRYSTALLOGRAPHY; MULTILAYERS; STRAIN; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

AVERAGE DOMAIN SIZE; MICROSTRAIN; MULTILAYERED STRUCTURE; TUNGSTEN SILICIDE;

TUNGSTEN COMPOUNDS;

EID: 28444482416     PISSN: 10735623     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11661-005-0089-0     Document Type: Article

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