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Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 20, Issue 3, 2002, Pages 754-761

Stress changes in chemical vapor deposition tungsten silicide (polycide) film measured by x-ray diffraction

(2) Pelleg, Joshua a Elish, E a

a BEN GURION UNIVERSITY OF THE NEGEV (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; ANNEALING; CHEMICAL VAPOR DEPOSITION; COMPRESSIVE STRESS; LATTICE CONSTANTS; MULTILAYERS; POLYSILICON; SILICON WAFERS; STRAIN; TENSILE STRESS; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

CAPPING; MULTILAYER PREPARATION PROCESS; POLYCIDE TUNGSTEN SILICIDE;

TUNGSTEN COMPOUNDS;

EID: 0036564768 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.1467663 Document Type: Article

Times cited : (45)

References (42)

1
- 0032631332
- (1999) J. Electrochem. Soc. , vol.146 , pp. 2261
- Byun, J.S.¹ Lee, B.H.² Park, J.S.³ Sohn, D.K.⁴ Hong, J.⁵ Cho, W.J.⁶ Choi, S.J.⁷ Kim, J.J.⁸

2
- 0027710541
- (1993) J. Electrochem. Soc. , vol.140 , pp. 3689
- Telford, S.G.¹ Eizenberg, M.² Chang, M.³ Sinha, A.K.⁴ Gow, T.R.⁵

3
- 0032163674
- (1998) J. Electrochem. Soc. , vol.145 , pp. 3228
- Byun, J.S.¹ Lee, B.H.² Park, J.S.³ Sohn, D.K.⁴ Choi, S.J.⁵ Kim, J.J.⁶

4
- 0024069159
- (1988) Thin Solid Films , vol.163 , pp. 267
- Joshi, R.V.¹ Kim, Y.H.² Wetzel, J.T.³ Lin, T.⁴

5
- 0001151154
- (1991) Appl. Phys. Lett. , vol.58 , pp. 1425
- Washidzu, G.¹ Hara, T.² Miyamoto, T.³ Inoue, T.⁴

6
- 0025482576
- (1990) J. Electrochem. Soc. , vol.137 , pp. 2955
- Hara, T.¹ Miyamoto, T.² Hagiwara, H.³ Bromley, E.I.⁴ Horshbarger, W.R.⁵

7
- 0032482032
- (1998) Thin Solid Films , vol.320 , pp. 128
- Adachi, J.Y.¹ McIntosh, B.C.² Badt, D.E.³

8
- 0024766321
- (1989) Met. Trans. A , vol.20 A , pp. 2217
- Nix, W.D.¹

9
- 0022995398
- edited by M. Wittmer, J. Stimmell, and M. Strathman (Material Research Society, Pittsburgh)
- (1986) Materials Issues in Silicon Integrated Circuit Processing , vol.71 , pp. 395
- Towsend, P.H.¹ Fulks, R.T.² Vander Plas, H.A.³ Ho, J.⁴

10
- 0000303117
- (1988) J. Vac. Sci. Technol. B , vol.6 , pp. 1707
- Wu, T.H.T.¹ Rosler, R.S.² Lamartine, B.C.³ Gregory, R.B.⁴ Tompkins, H.G.⁵

11
- 0000244220
- (1988) J. Vac. Sci. Technol. B , vol.6 , pp. 1678
- Clark, T.E.¹

12
- 0000799518
- (1987) J. Appl. Phys. , vol.61 , pp. 561
- Shioya, Y.¹ Ikegami, K.² Maeda, M.³ Yanagida, K.⁴

13
- 0029346190
- (1995) J. Mater. Res. , vol.10 , pp. 1710
- Ger, M.L.¹ Brown, R.B.²

14
- 0019227199
- (1980) J. Appl. Phys. , vol.51 , pp. 6224
- Segmüller, A.¹ Angilelo, J.² La Placa, S.J.³

15
- 36549104385
- (1988) J. Appl. Phys. , vol.63 , pp. 126
- Doerner, M.F.¹ Brennan, S.²

16
- 0020099193
- (1982) Met. Trans. , vol.13 A , pp. 383
- Kuan, T.S.¹ Murakami, M.²

17
- 0024106549
- (1988) Jpn. J. Appl. Phys. , vol.27 , Issue.PART 1 , pp. 2203
- Yamamoto, N.¹ Hosokawa, Y.²

18
- 0029777240
- edited by R. Tung, K. Maex, P. W. Pellegrini, and L. H. Allen (Materials Research Society, Pittsburgh)
- (1996) Silicide Thin Films-Fabrication, Properties and Applications , vol.402 , pp. 625
- Fabricius, A.¹ Nennewitz, O.² Spiess, L.³ Cimalla, V.⁴ Pezoldt, J.⁵

19
- 0021405876
- (1984) J. Appl. Phys. , vol.55 , pp. 2874
- Pan, J.T.¹ Blech, I.²

20
- 0005981846
- Powder diffraction file, card 11-195
- JCPDS - ICDD - International Center for Diffraction Data, Swarthmore, PA, 1991

21
- 0004141015
- (Macmillan, New York)
- (1992) Electronic Thin Film Science
- Tu, K.N.¹ Mayer, J.W.² Feldman, L.C.³

22
- 0018335422
- (1980) J. Vac. Sci. Technol. , vol.17 , pp. 471
- Angilello, J.¹ D'Heurle, F.² Peterson, S.³ Segmüller, A.⁴

23
- 0027904951
- (1993) J. Cryst. Growth , vol.129 , pp. 266
- Christensen, A.N.¹

24
- 0010188486
- (1968) Inorg. Mater. (Transl. of Neorg. Mater.) , vol.4 , pp. 452
- Obukhov, A.P.¹ Gurin, V.N.² Kozlova, I.R.³ Terent'eva, Z.P.⁴ Mazina, T.I.⁵

25
- 0001195304
- (1966) Sov. Powder Metall. Met. Ceram , vol.5 , pp. 316
- Verkhoglyadova, T.S.¹ Vivchar, O.I.² Gladyshevskii, E.I.³

26
- 0000012254
- (1956) Monatshefts für Chemie , vol.87 , pp. 471
- Kudielka, H.¹ Novotny, H.²

27
- 34250548072
- (1952) Monatshefts für Chemie , vol.83 , pp. 1243
- Novotny, H.¹ Kieffer, R.² Schachner, H.³

28
- 0019047567
- (1980) Thin Solid Films , vol.70 , pp. 241
- Retajczyk, T.F.¹ Sinha, A.K.²

29
- 0019599450
- (1982) J. Appl. Phys. , vol.52 , pp. 5350
- Tsai, M.Y.¹ D'Heurle, F.M.² Peterson, C.S.³ Johnson, R.W.⁴

30
- 36549103765
- (1985) J. Appl. Phys. , vol.58 , pp. 4194
- Shioya, Y.¹ Itoh, T.² Inone, S.³ Maeda, M.⁴ Yanagida, K.⁵

31
- 0005912280
- edited by J. C. Bravman, W. D. Nix, D. M. Barnett, and D. A. Smith (Materials Research Society, Pittsburgh)
- (1986) Thin Films: Stresses and Mechanical Properties , vol.130 , pp. 389
- Huber, W.¹ Borionetti, G.² Villant, C.³

32
- 0017983205
- (1978) J. Electrochem. Soc. , vol.125 , pp. 927
- Kamins, T.I.¹ Mandurah, M.M.² Saraswat, K.C.³

33
- 0039149783
- edited by W. D. Nix, J. C. Bravman, E. Arzt, and L. B. Freund (Materials Research Society, Pittsburgh)
- (1991) Thin Films: Stresses and Mechanical Properties III , vol.239 , pp. 13
- Rulevitch, P.K.¹ Johnson, G.C.² Howe, R.T.³

34
- 0004315682
- (Giro, Croton-on Hudson, NY)
- (1995) Materials Science in Microelectronics, the Relationship Between Thin Film Processing and Structure , pp. 172
- Machlin, E.S.¹

35
- 0006003070
- edited by M. F. Doerner, W. C. Oliver, G. M. Pharr, and F. R. Brotzen (Material Research Society, Pittsburgh)
- (1990) Thin Films: Stresses and Mechanical Properties II , vol.188 , pp. 73
- Srinivasan, R.¹ Nguyen, B.C.² Short, A.P.³

36
- 0005948637
- edited by W. D. Nix, J. C. Bravman, E. Arzt, and L. B. Freund (Materials Research Society, Pittsburgh)
- (1991) Thin Films: Stresses and Mechanical Properties III , vol.239 , pp. 3
- Senturia, S.D.¹

37
- 0001177749
- (1986) J. Vac. Sci. Technol. B , vol.4 , pp. 720
- Kobeda, E.¹ Irene, E.A.²

38
- 0003602826
- (Academic, Boston)
- (1992) Materials Science of Thin Films
- Ohring, M.¹

39
- 0020205589
- (1982) J. Electrochem. Soc. , vol.129 , pp. 2594
- Irene, E.A.¹ Tierney, E.² Angilello, J.³

40
- 0003666012
- (Wiley, New York)
- (1994) VLSI Fabrication Principles , pp. 472
- Ghandhi, S.K.¹

41
- 0000267014
- (1990) J. Appl. Phys. , vol.67 , pp. 515
- Giroult, G.¹ Nouailhat, A.² Ganneau, M.³

42
- 0005946116
- (1990) Jpn. J. Appl. Phys. , vol.29 , Issue.PART 1 , pp. 2535
- Yoo, C.-S.¹ Liu, T.-H.² Tsai, N.-S.³ Ijzendoorn, L.J.⁴

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