Integrated tungsten polycide: Analysis of interface composition

Thin Solid Films

Volumn 320, Issue 1, 1998, Pages 128-133

  Adachi, John Y ^a   McIntosh, Bob C ^a,b   Badt, Dave E ^a  

^a AIXTRON Inc   (United States)

^b APPLIED MATERIALS INC   (United States)

Author keywords

Amorphous silicon; Chemical vapor deposition; Dichlorosilane tungsten silicide; Integrated polycide; Polysilicon

Indexed keywords

CHEMICAL VAPOR DEPOSITION; PHOSPHORUS; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING FILMS; SEMICONDUCTING SILICON; SEMICONDUCTOR DOPING; TUNGSTEN COMPOUNDS;

INTEGRATED POLYCIDE; TUNGSTEN SILICIDE;

INTERFACES (MATERIALS);

EID: 0032482032     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)01071-7     Document Type: Article

References (15)

1. M. Tsukamoto, H. Kuroda, Y. Okamoto, Symposium on VLSI Technology Digest of Technical Papers, IEEE Cat. No. 97CH36114, Kyoto, 1997, p. 23.
2. Asanga Perera et al., Symposium on VLSI Technology Digest of Technical Papers, IEEE Cat. No. 97CH36114, Kyoto, 1997, p. 29.
3. K.Y. Ahn, S. Basavaiah, Thin Solid Films 118 (1984) 163.
4. M. Fukumoto, T. Ohzone, Appl. Phys. Lett. 50 (14) (1987) 894.
5. Y. Shioya, S. Kawamura, I. Kobayashi, M. Maeda, K. Yanagida, J. Appl. Phys. 61 (11) (1987) 5103.
6. P.J. Wright, M. Wong, K.C. Saraswat, IEEE IEDM, 1987.
7. P.J. Wright, K.C. Saraswat, IEEE Trans. Electr. Dev. 36 (5) (1989) 879.
8. S.C. Selbrede, Semiconductor International, August 1988, p. 88.
9. J.E.J. Schmitz, J.Y. Adachi, Semiconductor World, December 1992.
10. T. Hara et al., J. Electrochem. Soc. 137 (9) (1990) 2955.
11. T.E. Clark, J. Vac. Sci. Tech. 6 (6) (1988) 1678.
12. R.C. Ellwanger, K.D. Prall, D.R. Malinaric, R.W. Williams, J.E.J. Schmitz, E.I. Bromley, in: G.C. Smith, R. Blumenthal (Eds.), Tungsten and Other Advanced Metals for ULSI Application, MRS, Pittsburgh, PA, 1991, p. 335.
13. M.L. Yu, B.N. Eldridge, R.V. Joshi, in: V.A. Wells (Ed.), Proceedings of the Workshop on Tungsten and Other Refractory Metals for VLSI Applications III, Materials Research Society, 75, Pittsburgh, PA, 1988.
14. T.H. Wu et al., J. Vac. Sci. Tech. B 6 (6) (1988) 1707.
15. E.K. Broadbent, C.L. Ramiller, J. Electrochem. Soc. 131 (6) (1984) 1427.