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Volumn 27, Issue 5, 1996, Pages 739-750

Transport of submicron particles from a leak to a perpendicular surface in a chamber at reduced pressure

Author keywords

[No Author keywords available]

Indexed keywords

AEROSOLS; DEPOSITION; DIFFUSION IN GASES; MATHEMATICAL MODELS; OPTICAL MICROSCOPY; PRESSURE EFFECTS; SEMICONDUCTOR DEVICE MANUFACTURE; SURFACES; TRANSPORT PROPERTIES;

EID: 0030200704     PISSN: 00218502     EISSN: None     Source Type: Journal    
DOI: 10.1016/0021-8502(96)00023-7     Document Type: Article
Times cited : (5)

References (11)
  • 1
    • 0022128301 scopus 로고
    • Thermophoretic deposition of particles in gas flowing over cold surfaces
    • Batchelor, G. K. and Shen, C. (1985) Thermophoretic deposition of particles in gas flowing over cold surfaces. J. Colloid Interf. Sci. 107, 21-37.
    • (1985) J. Colloid Interf. Sci. , vol.107 , pp. 21-37
    • Batchelor, G.K.1    Shen, C.2
  • 2
    • 0024753466 scopus 로고
    • Predicted deposition of submicrometer particles due to diffusion and electrostatics in viscous axisymmetric stagnation-point flow
    • Cooper, D. W., Peters, M. H. and Miller, R. J. (1989) Predicted deposition of submicrometer particles due to diffusion and electrostatics in viscous axisymmetric stagnation-point flow. Aerosol Sci. Technol. 11, 133-143.
    • (1989) Aerosol Sci. Technol. , vol.11 , pp. 133-143
    • Cooper, D.W.1    Peters, M.H.2    Miller, R.J.3
  • 4
    • 0028446652 scopus 로고
    • Combined effect of electrophoresis and thermophoresis on particle deposition onto flat surfaces
    • Opiolka, S., Schmidt, F. and Fissan, H. (1994) Combined effect of electrophoresis and thermophoresis on particle deposition onto flat surfaces. J. Aerosol Sci. 25, 665-671.
    • (1994) J. Aerosol Sci. , vol.25 , pp. 665-671
    • Opiolka, S.1    Schmidt, F.2    Fissan, H.3
  • 5
    • 0024921794 scopus 로고
    • Particle deposition on wafers: A comparison between two modelling approaches
    • Peterson, T. W., Sannes, K. M., Stratmann, F. and Fissan, H. (1989) Particle deposition on wafers: a comparison between two modelling approaches. J. Aerosol Sci. 20, 683-693.
    • (1989) J. Aerosol Sci. , vol.20 , pp. 683-693
    • Peterson, T.W.1    Sannes, K.M.2    Stratmann, F.3    Fissan, H.4
  • 7
    • 0012019911 scopus 로고
    • Numerische berechnung des partikeltransportes zu einer laminaren angeströmten kreisscheibe
    • Schmidt, F., Fissan, H. and Schmidt, K. G. (1994) Numerische berechnung des partikeltransportes zu einer laminaren angeströmten kreisscheibe. Wärme- und Stoffübertragung 30, 47-54.
    • (1994) Wärme- und Stoffübertragung , vol.30 , pp. 47-54
    • Schmidt, F.1    Fissan, H.2    Schmidt, K.G.3
  • 8
    • 0025596602 scopus 로고
    • Methods for detection of submicron particles by a lightmicroscope
    • Schmidt, F., Schmidt, K. G. and Fissan, H. (1990) Methods for detection of submicron particles by a lightmicroscope. J. Aerosol Sci. 21, 535-538.
    • (1990) J. Aerosol Sci. , vol.21 , pp. 535-538
    • Schmidt, F.1    Schmidt, K.G.2    Fissan, H.3
  • 9
    • 0024107707 scopus 로고
    • Particle deposition onto a flat surface from a point particle source
    • Stratmann, F., Fissan, H. and Peterson. W. T. (1988) Particle deposition onto a flat surface from a point particle source. J. Envir. Sci. 39-41.
    • (1988) J. Envir. Sci. , pp. 39-41
    • Stratmann, F.1    Fissan, H.2    Peterson, W.T.3
  • 10
    • 0024876603 scopus 로고
    • Numerical solution of aerosol dynamics for simultaneous convection diffusion and external forces
    • Stratmann, F. and Whitby, E. R. (1989) Numerical solution of aerosol dynamics for simultaneous convection diffusion and external forces. J. Aerosol Sci. 20, 437-440.
    • (1989) J. Aerosol Sci. , vol.20 , pp. 437-440
    • Stratmann, F.1    Whitby, E.R.2
  • 11
    • 0025746075 scopus 로고
    • Thermophoretic effect of particle deposition on a free-standing semiconductor wafer in a clean room
    • Ye, Y., Pui, D. Y. H, Liu, B. Y. H., Opiolka, S. Blumhorst, S. and Fissan, H. (1991) Thermophoretic effect of particle deposition on a free-standing semiconductor wafer in a clean room. J. Aerosol Sci. 22, 63-72.
    • (1991) J. Aerosol Sci. , vol.22 , pp. 63-72
    • Ye, Y.1    Pui, D.Y.H.2    Liu, B.Y.H.3    Opiolka, S.4    Blumhorst, S.5    Fissan, H.6


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.