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Volumn , Issue , 2004, Pages 343-347

Nanoindentation study of the sputtered Cu thin films for interconnect applications

Author keywords

[No Author keywords available]

Indexed keywords

ELASTIC MODULI; HARDNESS; INDENTATION; MAGNETRON SPUTTERING; SILICON WAFERS; THIN FILMS;

EID: 28444435224     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (8)

References (14)
  • 1
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  • 2
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  • 3
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  • 4
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    • Nanocrystalline materials
    • Suryanarayana, C., "Nanocrystalline Materials", Int Mater Re, Vol. 40, (1995), pp. 41-64.
    • (1995) Int Mater Re , vol.40 , pp. 41-64
    • Suryanarayana, C.1
  • 5
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    • Nanostructured materials: Basic concepts and microstructure
    • Gleiter, H., "Nanostructured Materials: Basic Concepts and Microstructure", Acta Mater. Vol. 48, (2000), pp. 1-29.
    • (2000) Acta Mater , vol.48 , pp. 1-29
    • Gleiter, H.1
  • 6
    • 1642601486 scopus 로고    scopus 로고
    • Mechanical properties of nanocrystalline copper and nickel
    • Siow, K. S., Tay, A. A. O., Oruganti, P., "Mechanical Properties of Nanocrystalline Copper and Nickel", Mater Sci Tech. Vol. 20, (2004), pp. 285-294.
    • (2004) Mater Sci Tech. , vol.20 , pp. 285-294
    • Siow, K.S.1    Tay, A.A.O.2    Oruganti, P.3
  • 7
    • 0142211287 scopus 로고    scopus 로고
    • Mechanical behavior of nanocrystalline metals and alloys
    • Kumar, K. S., Swygenhoven, H. V., Suresh, S., "Mechanical Behavior of Nanocrystalline Metals and Alloys", Acta Mater., Vol. 51, (2003), pp. 5743-5774.
    • (2003) Acta Mater. , vol.51 , pp. 5743-5774
    • Kumar, K.S.1    Swygenhoven, H.V.2    Suresh, S.3
  • 8
    • 0036892523 scopus 로고    scopus 로고
    • Nanomechanical properties of copper thin Films on different substrates using the nanoindentation technique
    • Fang, T. H., Chang, W. J., "Nanomechanical Properties of Copper Thin films on Different Substrates using the Nanoindentation Technique", Microelectronic Engg, Vol. 65 (2003), pp. 231-238.
    • (2003) Microelectronic Engg , vol.65 , pp. 231-238
    • Fang, T.H.1    Chang, W.J.2
  • 9
    • 6044273860 scopus 로고    scopus 로고
    • Nanoindentation of Au and Pt/Cu thin films at elevated temperature
    • Volinsky, A. A., Moody, N. R., Gerberich, W. W., "Nanoindentation of Au and Pt/Cu thin films at elevated temperature", J. Mater. Res. Vol. 19, No. 9, (2004), pp. 2650-57.
    • (2004) J. Mater. Res. , vol.19 , Issue.9 , pp. 2650-2657
    • Volinsky, A.A.1    Moody, N.R.2    Gerberich, W.W.3
  • 10
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    • Nanoindentation of copper thin films on silicon substrates
    • Suresh, S., Nieh, T.G., and Choi, B.W., "Nanoindentation of Copper Thin Films on Silicon Substrates" Scripta Materialia, Vol. 41, No. 9, (1999), pp. 951-57.
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    • Suresh, S.1    Nieh, T.G.2    Choi, B.W.3
  • 12
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    • Deformation behavior of thin copper films on deformable substrates
    • Hommel, M., and Kraft, O., "Deformation Behavior of Thin Copper Films on Deformable Substrates", Acta Mater., Vol. 49, (2001), pp. 3935-3947.
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  • 14
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    • Effect of process variables on the structrue, residual stress and hardness of sputtered nanocrystalline nickel films
    • Mitra, R., Hoffman, R.A., Madan, A., Weertman, J.R., "Effect of Process Variables on the Structrue, Residual stress and Hardness of Sputtered Nanocrystalline Nickel films", J. Mate. Res., Vol. 16, No. 4, (2001), pp. 1010-1027.
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    • Mitra, R.1    Hoffman, R.A.2    Madan, A.3    Weertman, J.R.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.