Thermally-induced formation of Si wire array on an ultrathin (111) silicon-on-insulator substrate

Applied Physics Letters

Volumn 87, Issue 12, 2005, Pages 1-3

  Burhanudin, Zainal A ^a   Nuryadi, Ratno ^a   Ishikawa, Yasuhiko ^a   Tabe, Michiharu ^a   Ono, Yukinori ^b  

^a SHIZUOKA UNIVERSITY   (Japan)

^b NTT Basic Research Laboratories   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AGGLOMERATION; ARRAYS; ATOMIC FORCE MICROSCOPY; SILICON ON INSULATOR TECHNOLOGY; ULTRAHIGH VACUUM; ULTRATHIN FILMS;

ISLAND FORMATION; SI WIRE ARRAY; THERMAL AGGLOMERATION;

AMORPHOUS SILICON;

EID: 28344444558     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2053354     Document Type: Article

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