Effect of patterning on thermal agglomeration of ultrathin silicon-on-insulator layer

Applied Surface Science

Volumn 190, Issue 1-4, 2002, Pages 11-15

  Ishikawa, Yasuhiko ^a   Kumezawa, Minoru ^a   Nuryadi, Ratno ^a   Tabe, Michiharu ^a  

^a SHIZUOKA UNIVERSITY   (Japan)

Author keywords

Agglomeration; Atomic force microscopy; Patterning; Silicon on insulator

Indexed keywords

AGGLOMERATION; ANNEALING; ATOMIC FORCE MICROSCOPY; DIFFUSION; ETCHING; LITHOGRAPHY; ULTRAHIGH VACUUM; ULTRATHIN FILMS;

THERMAL AGGLOMERATION;

SILICON ON INSULATOR TECHNOLOGY;

EID: 0037042005     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(01)00833-9     Document Type: Conference Paper

References (14)