X-ray absorption in relation to valency of iridium in sputtered iridium oxide films

Journal of Electroanalytical Chemistry

Volumn 465, Issue 1, 1999, Pages 88-95

  Pauporté, Thierry ^a   Aberdam, Daniel ^b   Hazemann, Jean Louis ^c   Faure, René ^a   Durand, Robert ^a  

^a GRENOBLE INSTITUTE OF TECHNOLOGY   (France)

^b LABORATOIRE DE CRISTALLOGRAPHIE   (France)

^c UNIV GRENOBLE ALPES   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; ATOMS; ELECTRON ENERGY LEVELS; ELECTRONIC STRUCTURE; IRIDIUM COMPOUNDS; METALLIC FILMS; OXIDATION; PROTONS; SPUTTERING; X RAY SPECTROSCOPY;

IRIDIUM OXIDES; PROTON INSERTION; SPUTTERED IRIDIUM OXIDE FILMS; VALENCY; X RAY ABSORPTION SPECTROSCOPY;

IRIDIUM;

EID: 0032657179     PISSN: 00220728     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0728(99)00058-3     Document Type: Article

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