Computer simulation of surface modification with ion beams

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 241, Issue 1-4, 2005, Pages 496-500

  Insepov, Z ^a   Hassanein, A ^a   Swenson, D ^b   Terasawa, M ^c  

^a ARGONNE NATIONAL LABORATORY   (United States)

^b Epion Corporation   (United States)

^c UNIVERSITY OF HYOGO   (Japan)

Author keywords

Extreme ultra violet lithography; Gas cluster ion beam; Highly charged ions; Sputtering

Indexed keywords

COMPUTER SIMULATION; ENERGY TRANSFER; GAS DYNAMICS; ION BEAMS; IONS; KINETIC ENERGY; LITHOGRAPHY; MOLECULAR DYNAMICS; SPUTTERING; SURFACE CHEMISTRY;

EXTREME ULTRA-VIOLET LITHOGRAPHY; GAS CLUSTER ION BEAMS; HIGHLY CHARGED IONS; SURFACE SPUTTERING;

SURFACE TREATMENT;

EID: 28044442705     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2005.07.061     Document Type: Conference Paper

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