Investigation of work function tuning using multiple layer metal gate electrodes stacks for complementary metal-oxide-semiconductor applications

Applied Physics Letters

Volumn 87, Issue 22, 2005, Pages 1-3

  Jha, Rashmi ^a   Lee, JaeHoon ^a   Majhi, Prashant ^b   Misra, Veena ^a  

^a North Carolina State University   (United States)

^b SEMATECH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEBYE LENGTH; ELECTRON WAVE FUNCTION; METAL GATE ELECTRODES; TANTALUM NITRIDE;

DIELECTRIC DEVICES; MOS DEVICES; TANTALUM COMPOUNDS;

ELECTRODES;

EID: 27944471759     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2136425     Document Type: Article

References (8)

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