-
1
-
-
33845463417
-
Large-grain polycrystalline silicon films with low intragranular defect density by low-temperature solid-phase crystallization without underlying oxide
-
X.Z. Bo, N. Yao, S.R. Shieh, T.S. Duffy and U.C. Sturm, "Large-grain polycrystalline silicon films with low intragranular defect density by low-temperature solid-phase crystallization without underlying oxide", J. Appl. Phys. 91, 2002, pp. 2910-2915.
-
(2002)
J. Appl. Phys.
, vol.91
, pp. 2910-2915
-
-
Bo, X.Z.1
Yao, N.2
Shieh, S.R.3
Duffy, T.S.4
Sturm, U.C.5
-
2
-
-
0036536777
-
Microstructure of laser-crystallized silicon thin films on glass substrate
-
M. Nerding, R. Dassow, S. Christiansen, J.R. Köhler, J.Krinke, J.H. Werner and H.-P. Strunk, "Microstructure of laser-crystallized silicon thin films on glass substrate", J. Appl. Phys. 91, 2002, pp. 4125-4130.
-
(2002)
J. Appl. Phys.
, vol.91
, pp. 4125-4130
-
-
Nerding, M.1
Dassow, R.2
Christiansen, S.3
Köhler, J.R.4
Krinke, J.5
Werner, J.H.6
Strunk, H.-P.7
-
3
-
-
3142561382
-
Electric-field-enhanced crystallization of amorphous silicon
-
J. Jang, J.Y. Oh, S.K. Kim, Y.J. Choi, S.Y. Yoon and C.O. Kim, "Electric-field-enhanced crystallization of amorphous silicon", Nature 395, 1998, 481.
-
(1998)
Nature
, vol.395
, pp. 481
-
-
Jang, J.1
Oh, J.Y.2
Kim, S.K.3
Choi, Y.J.4
Yoon, S.Y.5
Kim, C.O.6
-
4
-
-
9644309178
-
2 plasma
-
2 Plasma", Chin. Phys. Lett. 21, 2004, pp. 1168-1170.
-
(2004)
Chin. Phys. Lett.
, vol.21
, pp. 1168-1170
-
-
Huang, R.1
Lin, X.Y.2
Yu, Y.P.3
Lin, K.X.4
Wei, J.H.5
Yu, C.Y.6
Wang, Z.K.7
-
6
-
-
21544472972
-
Structural properties of polycrystalline silicon films prepared at low temperature by plasma chemical vapor deposition
-
H.Kakinuma, M.Mohri, M.Sakamoto and T.Tsuruoka, "Structural properties of polycrystalline silicon films prepared at low temperature by plasma chemical vapor deposition", J. Appl. Phys. 70, 1991, pp. 7374-7381.
-
(1991)
J. Appl. Phys.
, vol.70
, pp. 7374-7381
-
-
Kakinuma, H.1
Mohri, M.2
Sakamoto, M.3
Tsuruoka, T.4
-
7
-
-
0032614007
-
Photoluminescence and Raman studies in thin-film materials: Transition from amorphous to microcrystalline silicon
-
G.Z.Yue, J.D.Lorentzen, J.Lin and D.X.Han, "Photoluminescence and Raman studies in thin-film materials: Transition from amorphous to microcrystalline silicon", Appl. Phys. Lett. 75, 1999, pp. 492-494.
-
(1999)
Appl. Phys. Lett.
, vol.75
, pp. 492-494
-
-
Yue, G.Z.1
Lorentzen, J.D.2
Lin, J.3
Han, D.X.4
-
8
-
-
0039463740
-
Measurements in silane radio frequency glow discharges using a tuned and heated Langmuir probe
-
K.X.Lin, X.Y.Lin, Y.P.Yu, H.Wang and J.Y.Chen, "Measurements in silane radio frequency glow discharges using a tuned and heated Langmuir probe", J. Appl. Phys. 74, 1993, pp. 4899-4902.
-
(1993)
J. Appl. Phys.
, vol.74
, pp. 4899-4902
-
-
Lin, K.X.1
Lin, X.Y.2
Yu, Y.P.3
Wang, H.4
Chen, J.Y.5
|