Development of plasma chip

Surface and Coatings Technology

Volumn 133-134, Issue , 2000, Pages 497-500

  Ito, T ^a   Izaki, T ^a,b   Terashima, K ^a  

^a UNIVERSITY OF TOKYO   (Japan)

^b Texas Instruments Japan Ltd   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

LANGMUIR BLODGETT FILMS; MICROELECTRODES; PLASMAS; SPECTROSCOPIC ANALYSIS;

COPLANAR FILM ELECTRODES; LANGMUIR PROBE MEASUREMENTS; MICROSCALE PLASMAS; OPTICAL EMISSION SPECTROSCOPY; PLASMA CHIPS;

PROTECTIVE COATINGS;

PLASMA TREATMENT;

EID: 0034310637     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(00)00982-8     Document Type: Article

References (11)

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2. T. Ito, T. Izaki and K. Terashima, in: M. Hrabovský (Ed.) Proc. 14th Int. Symp. Plasma Chem. (ISPC-14), Prague, 1999, p. 967.
3. T. Ito, T. Izaki, K. Terashima, To be published in Thin Solid Films (2000).
4. H.R. Griem, Spectral Line Broadening by Plasmas, Academic Press, New York, 1974.
5. H.M. Mott-Smith, I. Langmuir, Phys. Rev. 28 (1926) 727.
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7. J.S. Chang, J.G. Laframboise, Phys. Fluids 19 (1976) 25.
8. M. Kamitsuma, S. Teii, Phys. Fluids. 25 (1982) 1169.
9. R.J Colton, Procedures in Scanning Probe Microscopies, John Wiley & Sons, Chichester, 1998.
10. M.J. Vasile, D.A. Grigg, I.E. Griffith, E.A. Fitzgerald, P.E. Russell, Rev. Sci. Instrum. 62 (1991) 2167.
11. H. Kawasaki, K. Ara, K. Terashima, To be published in Thin Solid Films (2000).