Multiple microscale plasma CVD apparatuses on a substrate

Thin Solid Films

Volumn 390, Issue 1-2, 2001, Pages 234-236

  Ito, Tsuyohito ^a   Terashima, Kazuo ^a  

^a UNIVERSITY OF TOKYO   (Japan)

Author keywords

Carbon film; Microscale plasma; Plasma chemical vapor deposition; Plasma chip

Indexed keywords

CARBON FIBERS; ELECTRODES; HYDROGEN; METHANE; SUBSTRATES;

MICROSCALE PLASMAS;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 0035973352     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(01)00955-5     Document Type: Article

References (8)