Aluminum nitride thin films on an LTCC substrate

Journal of the American Ceramic Society

Volumn 88, Issue 7, 2005, Pages 1977-1980

  Lee, Jung W ^a   Cuomo, Jerome J ^a   Cho, Yong S ^b,d   Keusseyan, Roupen L ^c  

^a North Carolina State University   (United States)

^b Yonsei University   (South Korea)

^c DUPONT COMPANY   (United States)

^d AMERICAN CERAMIC SOCIETY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

C-AXIS ORIENTATIONS; DEPOSITION TEMPERATURE; LOW-TEMPERATURE COFIRED CERAMICS (LTCC); OXYGEN-RELATED DEFECTS;

CERAMIC MATERIALS; CRYSTAL ORIENTATION; LOW TEMPERATURE EFFECTS; MAGNETRON SPUTTERING; MICROSTRUCTURE; PHOTOLUMINESCENCE; SPECTRUM ANALYSIS; THERMAL CONDUCTIVITY; THIN FILMS;

ALUMINUM NITRIDE;

EID: 27644571485     PISSN: 00027820     EISSN: None     Source Type: Journal    
DOI: 10.1111/j.1551-2916.2005.00250.x     Document Type: Article

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