Self-assembly of 1,4-phenylene diisocyanide and terephthalic acid on Ni, Cu and Pt

Journal of Colloid and Interface Science

Volumn 292, Issue 1, 2005, Pages 71-78

  Pranger, Lawrence ^a   Tannenbaum, Rina ^a  

^a Georgia Institute of Technology   (United States)

Author keywords

Phenylene diisocyanide; PM IRRAS; Self assembly; Terephthalic acid; XPS

Indexed keywords

CROSS-LINK DENSITY; EQUIMOLAR SOLUTIONS; STRESS TANSFER;

ADSORPTION; CROSSLINKING; NANOSTRUCTURED MATERIALS; SELF ASSEMBLY; X RAY PHOTOELECTRON SPECTROSCOPY;

ORGANIC ACIDS;

1,4 PHENYLENE DIISOCYANIDE; BENZENE DERIVATIVE; COPPER; CYANIDE; NICKEL; PLATINUM; POLYMER; TEREPHTHALIC ACID; UNCLASSIFIED DRUG;

ADSORPTION; ANALYTIC METHOD; ARTICLE; CHEMICAL ANALYSIS; CHEMICAL BOND; COMPARATIVE STUDY; COMPOSITE MATERIAL; CROSS LINKING; FILM; PHYSICAL PARAMETERS; PRIORITY JOURNAL; X RAY PHOTOELECTRON SPECTROSCOPY;

ADSORPTION; COPPER; CYANIDES; NICKEL; NITRILES; PHTHALIC ACIDS; PLATINUM; SENSITIVITY AND SPECIFICITY; SPECTROMETRY, X-RAY EMISSION; SURFACE PROPERTIES;

EID: 27544513979     PISSN: 00219797     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcis.2005.05.044     Document Type: Article

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