Determination of mechanical properties of silicon nitride thin films using nanoindentation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5798, Issue , 2005, Pages 216-225

  Martyniuk, Mariusz ^a   Antoszewski, Jarek ^a   Walmsley, Byron A ^a   Musca, Charles A ^a   Dell, John M ^a   Jung, Yeon Gil ^b   Lawn, Brian R ^b   Huang, Han ^a   Faraone, Lorenzo ^a  

^a UNIVERSITY OF WESTERN AUSTRALIA   (Australia)

^b NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

Hardness; Modulus; Nanoindentation; Silicon nitride; Thin films

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELASTIC MODULI; HARDNESS; INDENTATION; MICROELECTROMECHANICAL DEVICES; RELIABILITY; SILICON NITRIDE; SUBSTRATES;

DEPOSITION TEMPERATURE; MICROSYSTEMS; MODULUS; NANOINDENTATION;

THIN FILMS;

EID: 27544504249     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.604245     Document Type: Conference Paper

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