Low stress atomic layer deposited alumina for nano electro mechanical systems

Digest of Technical Papers - International Conference on Solid State Sensors and Actuators and Microsystems, TRANSDUCERS '05

Volumn 1, Issue , 2005, Pages 851-854

  Tripp, Marie K ^a   Stampfer, Christoph ^b   Herrmann, Cari F ^a   Hierold, Christofer ^b   George, Steven ^a   Bright, Victor M ^a  

^a UNIVERSITY OF COLORADO   (United States)

^b ETH ZURICH   (Switzerland)

Author keywords

Alumina; Aluminum oxide; Atomic layer deposition; NEMS

Indexed keywords

ALUMINUM OXIDE; ATOMIC LAYER DEPOSITION; NEMS; TEST STRUCTURES;

CHEMICAL RESISTANCE; DEPOSITION; FABRICATION; MICROELECTROMECHANICAL DEVICES; NANOTECHNOLOGY; TESTING;

ALUMINA;

EID: 27544484014     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/SENSOR.2005.1496551     Document Type: Conference Paper

References (9)

1. S. M. George, A. W. Ott and J. W. Klaus, "Surface Chemistry for Atomic Layer Growth," Journal of Physical Chemistry, 100, 13121-13131 (1996).
2. M. K. Tripp, C. F. Herrmann, S. M. George and V. M. Bright, "Ultra-thin multilayer nanomembranes for short wavelength deformable optics," The 17th IEEE Conference on Micro Electro Mechanical Systems (MEMS 2004), pp. 77-80, 2004.
3. L. Liu, O. M. Mukdadi, M. Tripp, J. R. Hertzberg, V. M. Bright and R. Shandas, "Atomic layer deposition for fabricating capacitive micromachined ultrasonic transducers: Initial Characterization", accepted for publication in the IEEE Transactions on Ultrasonics, March 2005.
4. J. W. Elam, M. D. Groner, and S. M. George, "Viscous flow reactor with quartz crystal microbalance for thin film growth by atomic layer deposition," Review of Scientific Instruments, 73(8), 2981-2987 (2002).
5. B. P. van Drieenhuizen, J. F. L. Goosen, P. J. French, and R. F. Wolffenbuttel, "Comparison of techniques for measuring both compressive and tensile stress in films," Sensors and Actuators A, 37-38, 756-765 (1993).
6. N. R. Moody, T.E. Buchheit, B.L. Boyce, S. Prasad, T.M. Mayer, and S.M. George, "Thickness Effects on the Mechanical Behavior of ALD Film," presented at Materials Research Society Spring Meeting, San Francisco, CA USA, April 12-16, 2004.
7. G. Simmons and H. Wang, Single Crystal elastic Constants and Calculated Aggregate Properties: A Handbook; Second Edition, pp. 146, M.I.T. Press, Cambridge, Massachusetts, 1971.
8. J. Proost and F. Spaepen, "Evolution of the growth stress, stiffness, and microstructure of Alumina thin films during vapor deposition," Journal of Applied Physics, 91, 204-215 (2002).
9. B. Bhushan, "Handbook of Nanotechnology", Springer, pp. 66, 2004.