Gray-scale lithography using mask-less exposure system

Digest of Technical Papers - International Conference on Solid State Sensors and Actuators and Microsystems, TRANSDUCERS '05

Volumn 2, Issue , 2005, Pages 1441-1444

  Totsu, Kentaro ^a   Fujishiro, Kenta ^a   Tanaka, Shuji ^a   Esashi, Masayoshi ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

3D; Gray scale; Mask less; Microlens; Photolithography

Indexed keywords

3D; GRAY-SCALE LITHOGRAPHY; MASK-LESS EXPOSURE SYSTEMS; PHOTORESIST PATTERNS;

ASPHERICS; DOSIMETRY; MASKS; MICROLENSES; MULTILAYERS; PHOTORESISTS; REACTIVE ION ETCHING; SILICON; SUBSTRATES; THREE DIMENSIONAL; ULTRAVIOLET RADIATION;

PHOTOLITHOGRAPHY;

EID: 27544458640     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/SENSOR.2005.1497353     Document Type: Conference Paper

References (13)

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