Optical lithography simulation for the whole resist process

Current Applied Physics

Volumn 6, Issue 1, 2006, Pages 48-53

  Kim, Sang Kon ^a   Lee, Ji Eun ^a   Park, Seung Wook ^a   Oh, Hye Keun ^a  

^a Hanyang University   (South Korea)

Author keywords

Benchmark simulation; Lithography simulation; Photolithography; Process latitude

Indexed keywords

SEMICONDUCTOR MATERIALS; SENSITIVITY ANALYSIS; SIMULATORS;

LITHOGRAPHY SIMULATION; SEMICONDUCTOR MANUFACTURING; SIMULATION TOOLS;

PHOTOLITHOGRAPHY;

EID: 27544434724     PISSN: 15671739     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cap.2004.12.003     Document Type: Article

References (7)

1. C.A. Mack, Inside PROLITH: A Compreshensive Guide to Optical Lithography Simulation, FINLE Technologies, Austin, 1997.
2. S.L. Lee, K.C. Ng, T. Orimoto, J. Pittenger, T. Horie, K. Adam, M. Cheng, E. Croffie, Y. Deng, F. Gennari, T. Pistor, G. Robins, M. Williamson, B. Wu, L. Yuan, and R. Neureuther Proc. SPIE 4346 2001 1500
3. http://www.kla-tencor.com.
4. http://www.solid-c.de.
5. S.-K. Kim, and H.-K. Oh J. Korean Phys. Soc. 41 2002 456
6. E.-J. Seo, H.-J. Bak, S.-K. Kim, Y.-S. Sohn, and H.-K. Oh J. Korean Phys. Soc. 40 2002 725
7. S.-K. Kim J. Korean Phys. Soc. 42 2003 S371