Characterization of ablation plasma ion implantation

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 240, Issue 1-2, 2005, Pages 36-39

  Belloni, F ^a   Doria, D ^a   Lorusso, A ^a   Nassisi, V ^a   Torrisi, L ^b   Calcagnile, L ^a   Quarta, G ^a   Bleiner, D ^c   Manno, D ^a  

^a UNIVERSITY OF SALENTO   (Italy)

^b UNIVERSITY OF MESSINA   (Italy)

^c SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

Author keywords

Implantation; Laser plasma; LIS

Indexed keywords

ENERGY DISPERSIVE SPECTROSCOPY; EXCIMER LASERS; ION IMPLANTATION; ION SOURCES; IRRADIATION; LASER ABLATION; LIGHT POLARIZATION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SECONDARY ION MASS SPECTROMETRY; SILICON; SUBSTRATES; X RAY PHOTOELECTRON SPECTROSCOPY;

EXTRACTION PHASE; IMPLANTATION; LASER PLASMA; PLASMA EFFECTS;

LASER PRODUCED PLASMAS;

EID: 27344433784     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2005.06.084     Document Type: Conference Paper

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