Diagnostic characterization of ablation plasma ion implantation

Journal of Applied Physics

Volumn 93, Issue 11, 2003, Pages 8876-8883

  Qi, B ^a   Gilgenbach, R M ^a   Jones, M C ^a   Johnston, M D ^a   Lau, Y Y ^a   Wang, L M ^a   Lian, J ^a   Doll, G L ^b   Lazarides, A ^b  

^a UNIVERSITY OF MICHIGAN   (United States)

^b TIMKEN COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC POTENTIAL; ENERGY DISPERSIVE SPECTROSCOPY; LASER ABLATION; LASER PRODUCED PLASMAS; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

ABLATION-PLASMA-ION-IMPLANTATION (APII);

ION IMPLANTATION;

EID: 0038650984     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1565822     Document Type: Article

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