Sensitivity enhancement in thermoreflectance microscopy of semiconductor devices using suitable probe wavelengths

Journal of Applied Physics

Volumn 98, Issue 6, 2005, Pages

  De Freitas, L R ^a   Da Silva, E C ^a   Mansanares, A M ^a   Tessier, G ^b   Fournier, D ^b  

^a UNIVERSITY OF CAMPINAS   (Brazil)

^b SORBONNE UNIVERSITÉ   (France)

Author keywords

[No Author keywords available]

Indexed keywords

OPTICAL CONSTANTS; OSCILLATING PATTERN; PROBE WAVELENGTH; THERMOREFLECTANCE MICROSCOPY;

ELECTROMAGNETIC WAVE REFLECTION; MICROELECTRONICS; POLYCRYSTALLINE MATERIALS; REFRACTIVE INDEX; SILICON;

SEMICONDUCTOR DEVICES;

EID: 26244452326     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2043231     Document Type: Article

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