Photothermal and electroreflectance images of biased metal-oxide-semiconductor field-effect transistors: Six different kinds of subsurface microscopy

Journal of Applied Physics

Volumn 82, Issue 1, 1997, Pages 423-426

  Batista, J A ^a   Mansanares, A M ^a   Da Silva, E C ^a   Fournier, D ^b  

^a UNIVERSITY OF CAMPINAS   (Brazil)

^b CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL DEFECTS; ELECTRIC PROPERTIES; MODULATION; OPTICAL MICROSCOPY; OPTICAL PROPERTIES; SEMICONDUCTOR DEVICE STRUCTURES; THERMAL EFFECTS;

BIAS CURRENT; ELECTROREFLECTANCE; PHOTOINJECTED CARRIER; REFLECTANCE MICROSCOPY; THERMOREFLECTANCE;

MOSFET DEVICES;

EID: 0031188372     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.365832     Document Type: Article

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