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Volumn 39, Issue 10, 2005, Pages 1197-1203

Kinetics of structural and phase transformations in thin SiOx films in the course of a rapid thermal annealing

Author keywords

[No Author keywords available]

Indexed keywords


EID: 26044456402     PISSN: 10637826     EISSN: None     Source Type: Journal    
DOI: 10.1134/1.2085270     Document Type: Article
Times cited : (29)

References (27)
  • 27
    • 0003679027 scopus 로고
    • McGraw-Hill, New York Mir, Moscow
    • VLSI Technology, Ed. by S. M. Sze (McGraw-Hill, New York, 1983; Mir, Moscow, 1986), Vol. 1.
    • (1983) VLSI Technology , vol.1
    • Sze, S.M.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.