Characterization of electroplated copper film using a mixture of CuSO 4 and CuSiF6 as the electrolyte

Journal of the Electrochemical Society

Volumn 152, Issue 8, 2005, Pages

  Wu, You Lin ^a   Yeh, Juin Tsun ^a   Cheng, Chao Shen ^b   Hwang, Huey Liang ^b  

^a NATIONAL CHI NAN UNIVERSITY   (Taiwan)

^b NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ELECTROLYTES; ELECTROPLATING; METALLIC FILMS; MIXTURES;

COPPER FILMS; ELECTROPLATED FILMS; SELF-ANNEALING EFFECTS;

COPPER;

EID: 25644452702     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1940751     Document Type: Article

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