Diffusion processes in NiTi/Si, NiTi/SiO2 and NiTi/Si 3N4 systems under annealing

Thin Solid Films

Volumn 458, Issue 1-2, 2004, Pages 314-321

  Jarrige, I ^a   Holliger, P ^b   Jonnard, P ^a  

^a SORBONNE UNIVERSITÉ   (France)

^b CEA LETI   (France)

Author keywords

Diffusion; Interfaces; Secondary ion mass spectrometry (SIMS); X Ray emission

Indexed keywords

ANNEALING; CRYSTALLOGRAPHY; CRYSTALS; DIFFUSION; INTERFACES (MATERIALS); MICROELECTROMECHANICAL DEVICES; SECONDARY ION MASS SPECTROMETRY; SHAPE MEMORY EFFECT; X RAY SPECTROSCOPY;

ELECTRICAL PROPERTIES; INTERFACIAL ZONE; NANOMETRIC SCALE ANALYSIS; X-RAY EMISSION;

NICKEL ALLOYS;

EID: 2542482093     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2003.12.039     Document Type: Article

References (19)

1. Wolf R.H., Heuer A.H. J. Microelectromech. Syst. 4:1995;206.
2. Holliger P., Laugier F., Dupuy J.C. Surf. Interface Anal. 34:2002;472.
3. Bonnelle C., Vergand F., Jonnard P., André J.M., Staub P.F., Avila P., Chargelègue P., Fontaine M.F., Laporte D., Paquier P., Ringuenet A., Rodriguez B. Rev. Sci. Instrum. 65:1994;3466.
4. Jonnard P. J. Phys. (Fr) IV. 8:1998;Pr9-33. and references therein.
5. Staub P.F. X-Ray Spectrom. 27:1998;43.
6. Staub P.F., Jonnard P., Vergand F., Thirion J., Bonnelle C. X-Ray Spectrom. 27:1998;58.
7. N. Frantz-Rodriguez, Ph.D. Thesis, Paris-Sud University, France, 2002.
8. Stemmer S., Duscher G., Scheu C., Heuer A.H., Rühle M. J. Mater. Res. 12:1997;1734.
9. Wu S.K., Chen J.Z., Wu Y.J., Wang J.Y., Yu M.N., Chen F.R., Kai J.J. Phil. Mag. A. 81:2001;1939.
10. Jarrige I., Jonnard P., Frantz-Rodriguez N., Danaie K., Bosseboeuf A. Surf. Interface Anal. 34:2002;694.
11. Chen J., Wei P., Huang Q., Huang Y. Mater. Lett. 35:1998;90.
12. Morgan A.E., Broadbent E.K., Ritz K.N., Sadana D.K., Burrow B.J. J. Appl. Phys. 64:1988;344.
13. Tu K.N. J. Appl. Phys. 48:1977;3379.
14. Tu K.N., Chu W.K., Mayer J.W. Thin Solid Films. 25:1975;403.
15. d'Heurle F., Petersson S., Stolt L., Strizker B. J. Appl. Phys. 53:1982;5678.
16. Taubenblatt M.A., Helms C.R. J. Appl. Phys. 53:1982;6308.
17. Jarrige I., Holliger P., Nguyen T.P., Ip J., Jonnard P. Microelectron. Eng. 70:2003;251.
18. Frantz N., Dufour-Gergam E., Grandchamp J.P., Bossebœuf A., Seiler W., Nouet G., Catillon G. Sensor. Actuat. A. 99:2002;59.
19. Barber D.J. Ultramicroscopy. 52:1993;101.