From diffusion processes to adherence properties in NiTi microactuators

Microelectronic Engineering

Volumn 70, Issue 2-4, 2003, Pages 251-254

  Jarrige, I ^a   Holliger, P ^b   Nguyen, T P ^c   Ip, J ^c   Jonnard, P ^a  

^a SORBONNE UNIVERSITÉ   (France)

^b CEA LETI   (France)

^c INSTITUT DES MATÉRIAUX JEAN ROUXEL   (France)

Author keywords

Adherence; Diffusion; Interface; NiTi; Si; Si3N 4; SiO2

Indexed keywords

ANNEALING; DIFFUSION; ETCHING; MICROACTUATORS; SECONDARY ION MASS SPECTROMETRY; X RAY PHOTOELECTRON SPECTROSCOPY;

MICROACTUATION APPLICATIONS;

NICKEL COMPOUNDS;

EID: 0142106905     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(03)00374-5     Document Type: Conference Paper

References (7)

1. Wolf R.H., Heuer A.H. TiNi (shape memory) films on silicon for MEMS applications. J. Microelectron. Syst. 4:1995;206-212.
2. N. Frantz-Rodriguez, Elaboration et caractérisation de films minces d'alliages à mémoire de forme en NiTi et NiTiCu pour microactionneurs en technologie silicium, Ph.D. thesis, Paris-Sud University, 2002.
3. Bonnelle C., Vergand F., Jonnard P., André J.-M., Staub P.-F., Avila P., Chargelègue P., Fontaine M.-F., Laporte D., Paquier P., Ringuenet A., Rodriguez B. Instrument for research on interfaces and surfaces. Rev. Sci. Instrum. 65:1994;3466-3471.
4. 4 systems under annealing, in press.
5. 2 interface: analysis of the electronic distributions. Surf. Interf. Anal. 34:2002;694-697.
6. 2 interfaces. Appl. Surf. Sci. 212-213:2003;689-693.
7. K. Danaie, Membrane micro-usinée par gravure chimique: application à la caractérisation des films minces, Ph.D. thesis, Paris-Sud University, 2002.