Fast modeling of 3D planar resist images for high-NA projection lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3051, Issue , 1997, Pages 567-577

  Ivin, Vladimir V ^a   Larin, Dmitry Y ^a   Lucas, Kevin D ^a   Makhviladze, Tariel M ^a   Rogov, Andrew A ^a   Verzunov, Sergey V ^a  

^a SOFT TEC   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; PERFORMANCE; PROJECTION SYSTEMS; VECTORS;

3D PLANAR RESIST IMAGES; NUMERICAL APERTURE; OPTICAL MICROLITHOGRAPHY;

PHOTOLITHOGRAPHY;

EID: 0031355277     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.276036     Document Type: Conference Paper

References (12)