Postdeposition relaxation of internal stress in sputter-grown thin films caused by ion bombardment

Journal of Applied Physics

Volumn 85, Issue 2, 1999, Pages 841-852

  Nowak, R ^a   Yoshida, F ^a   Morgiel, J ^b   Major, B ^b  

^a HIROSHIMA UNIVERSITY   (Japan)

^b Polska Akademia Nauk Oddzial w Krakowie   (Poland)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 24944486305     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.369249     Document Type: Article

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