A new method to enhance overlay tool performance

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5038 I, Issue , 2003, Pages 428-436

  Attota, Ravikiran ^a   Silver, Richard M ^a   Stocker, Michael ^a   Marx, Egon ^a   Jun, Jay ^a   Davidson, Mark ^b   Larrabee, Robert ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b Spectel Research Corp   (United States)

Author keywords

Optical interactions; Optimization; Overlay metrology; TIS; Truncation; Window size

Indexed keywords

ALGORITHMS; CALCULATIONS; CROSSTALK; DATA REDUCTION; DIFFRACTION GRATINGS; ERRORS; INTEGRAL EQUATIONS; LIGHT SCATTERING; MATHEMATICAL MODELS;

MODAL DIFFRACTION GRATING MODEL; OPTICAL CROSS TALK; OVERLAY MEASUREMENT; THEORETICAL OPTICAL SCATTERING MODELS; TOOL INDUCED SHIFT; TRUNCATION; WINDOW SIZE;

OPTICAL VARIABLES MEASUREMENT;

EID: 0141835037     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.488481     Document Type: Conference Paper

References (7)

1. D.J. Coleman, P.J. Larson, A.D. Lopata, W.A. Muth and A. Starikov, "On the accuracy of the overlay measurements: tool and mark asymmetry effects," SPIE, Vol. 1261, 1990, p. 139.
2. R. Silver, R. Attota, M. Stocker, J. Jun, E. Marx, R. Larrabee, B. Russo and M. Davidson, "Comparison of measured optical images profiles of silicon lines with two different theoretical models," SPIE, Vol. 4689, 2002, p. 409.
3. E. Marx, "Integral equation for scattering by a dielectric," IEEE Trans. Antennas Propagat., Vol. 32, 1984, p. 166.
4. E. Marx, "Electromagnetic scattering by a thick strip on a half space," Nat. Bur. Stand. (U.S) Tech. Note 1236, 1987.
5. M. Davidson, "Analytic waveguide solutions and the coherence probe microscope," Proceedings Microcircuit Engineering 90, Leuven, Belgium, September 1990.
6. G.L. Wojcik, J. Mould, Jr., E. Marx and M.P. Davidson, "Standard reference models for optical metrology simulation," Proceedings of SPIE, Vol. 1673, p. 70.
7. M. Davidson, B.H. Kleemann, and J. Bischoff, "A comparison between rigorous light scattering methods," in Optical Microlithography X, SPIE, Vol. 305, 1997, p.606.