Development of laser deposition package for modeling of EUV sources for microlithography

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5751, Issue II, 2005, Pages 840-851

  Makhin, Volodymyr ^a   Bauer, Bruno S ^a   Lindemuth, Irvin R ^a   Rice, Bryan J ^b  

^a UNIVERSITY OF NEVADA   (United States)

^b INTEL CORPORATION   (United States)

Author keywords

Atomic kinetics and radiation; EUV radiative source; Laser produced plasma; Li targets; MHD simulation; Sn; Xe

Indexed keywords

COMPUTER SIMULATION; LASER PRODUCED PLASMAS; MAGNETOHYDRODYNAMICS; MATHEMATICAL MODELS; RADIATION EFFECTS; RESONANCE; TIN; XENON;

ATOMIC KINETICS AND RADIATION; EUV RADIATIVE PLASMAS; LI TARGETS; MAGNETOHYDRODYNAMIC (MHD) SIMULATION;

LITHOGRAPHY;

EID: 24644504043     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.599942     Document Type: Conference Paper

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