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Volumn 5037 I, Issue , 2003, Pages 130-140
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Development of radiation-magnetohydrodynamic computer modeling of gas-discharge EUV sources for microlithography
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Author keywords
Atomic kinetics and radiation model; Dense plasma focus; EUV radiative source; MHD simulation
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Indexed keywords
ATOMS;
COMPUTER SIMULATION;
ELECTRIC DISCHARGES;
IONS;
LIGHT SOURCES;
MAGNETOHYDRODYNAMICS;
MATHEMATICAL MODELS;
PLASMAS;
REACTION KINETICS;
TEMPERATURE;
ULTRAVIOLET RADIATION;
XENON;
COLLISIONAL RADIATIVE ATOMIC KINETICS;
DENSE PLASMA FOCUS;
EXTREME ULTRAVIOLET;
GAS DISCHARGE;
RADIATION MAGNETOHYDRODYNAMIC COMPUTER MODELLING;
LITHOGRAPHY;
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EID: 0141836160
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.484933 Document Type: Conference Paper |
Times cited : (4)
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References (4)
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