Photoluminescence at 1540 nm from erbium-doped amorphous silicon carbide films

Journal of Materials Research

Volumn 19, Issue 8, 2004, Pages 2389-2393

  Gallis, Spyros ^a   Efstathiadis, Harry ^a   Huang, Mengbing ^a   Nyein, Ei Ei ^b   Hommerich, Uwe ^b   Kaloyeros, Alain E ^a  

^a STATE UNIVERSITY OF NEW YORK   (United States)

^b HAMPTON UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; CHEMICAL VAPOR DEPOSITION; ERBIUM; FILM GROWTH; OPTOELECTRONIC DEVICES; PHOTOLUMINESCENCE; QUENCHING; STOICHIOMETRY;

LUMINESCENCE QUENCHING; SILICON CARBIDE FILMS; THERMAL CHEMICAL VAPOR DEPOSITION;

SILICON CARBIDE;

EID: 4644230083     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.2004.0292     Document Type: Article

References (18)

1. A. Polman: J. Appl. Phys. 82, 1 (1997).
2. S. Coffa, G. Franzò and F. Priolo: MRS Bull. 23, 25 (1998).
3. P.N. Favennec, H. L'Haridon, M. Salvi, D. Moutonnet, and Y. Le Guillon: Electron. Lett. 25, 718 (1989).
4. Rare Earth Doped Semiconductors II, edited by S. Coffa, A. Polman, and R.N. Schwartz (Mater. Res. Soc. Symp. Proc. 422, Pittsburgh, PA, 1996).
5. A.R. Zanatta: Appl. Phys. Lett. 82, 1395 (2003).
6. I.G. Ivanov, T. Egilsson, A. Henry, B. Monemar, and E. Janzén: Phys. Rev. B 64, 085203 (2001).
7. T. Ma, J. Xu, J. Du, W. Li, X. Huang, and K. Chen: J. Appl. Phys. 88, 6408 (2000).
8. E.I. Terukov and V. Kh. Kudoyarova, A.N. Kuznetsov, W. Fuhs, G. Weiser and H. Küehne: J. Non-Cryst. Solids 227, 488 (1998).
9. H. Küehne, G. Weiser, E.I. Terukov, A.N. Kuznetsov, and V. Kh. Kudoyarova. J. Appl. Phys. 86, 896 (1999).
10. J.P. Biersack and L.G. Haggmark: Nucl. Instrum. Methods 174, 257 (1980).
11. K. Awahara, S. Uekusa, T. Goto, T. Kobayashi, and M. Kumagai: Nucl. Instrum. Methods Phys. Res., Sect. B 148, 507 (1999).
12. H. Przybylinska, W. Jantsch, Y. Suprun-Belevitch, M. Stepikhova, L. Palmetshofer, G. Hendorfer, A. Kozanecki, R.J. Wilson, and B.J. Sealy: Phys. Rev. B 54, 2532 (1996).
13. G. Foti: Appl. Surf. Sci. 184, 20 (2001).
14. M.B. Huang and X.T. Ren: Phys. Rev. B 68, 33203 (2003).
15. W.J. Choyke, R.P. Devaty, L.L. Clemen, M. Yoganathan, G. Pensl, and Chässler: Phys. Lett. 65, 1668 (1994).
16. F. Lu, R. Carius, A. Alam, M. Heuken, A. Rizzi, and Ch. Buchal: Thin Solid Films 425, 171 (2003).
17. A. Kozanecki, W. Jantsch, S. Lanzerstorfer, B.J. Sealy, and S. Jackson: Mater. Sci. Forum 258, 1545 (1997).
18. F. Pellé, F. Auzel, J.M. Zavada, D.S. Lee, and A.J. Steckl: Mater. Sci. Eng. B 105, 126 (2003).