Automated OPC optimization using in-line CD-SEM

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4181, Issue 1, 2000, Pages 80-83

  Su, Bo ^a   Menaker, Mina ^b   Haas, Nadav ^b   Subramanian, Ramkumar ^c   Singh, Bhanwar ^c  

^a Process Diagnostics and Control Group   (United States)

^b Process Diagnostics and Control Group   (Israel)

^c AMID   (United States)

Author keywords

CD SEM; Image transfer; Lithography; Mask; OPC; Optimization

Indexed keywords

ALGORITHMS; MASKS; OPTICAL RESOLVING POWER; OPTIMIZATION; PROCESS ENGINEERING; SCANNING ELECTRON MICROSCOPY;

OPTICAL PROXIMITY CORRECTION (OPC);

PHOTOLITHOGRAPHY;

EID: 0034547209     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.395714     Document Type: Article

References (0)