Combining OPC and design for printability into 65nm logic designs

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5379, Issue , 2004, Pages 158-169

  Lucas, Kevin ^a   Yuan, Chi Min ^b   Boone, Robert ^a   Strozewski, Kirk ^b   Porter, Jason ^b   Tian, Ruiqi ^b   Wimmer, Karl ^a   Cobb, Jonathan ^b   Wilkinson, Bill ^b   Toublan, Olivier ^c  

^a MOTOROLA INC   (United States)

^b MOTOROLA INC   (United States)

^c MENTOR GRAPHICS CORPORATION   (United States)

Author keywords

Design for manufacturability; DFM; Lithography; OPC; Optical proximity correction

Indexed keywords

DESIGN FOR TESTABILITY; EXTRAPOLATION; FRACTURE; HEURISTIC METHODS; INTEGRATED CIRCUIT LAYOUT; LIGHTING; LITHOGRAPHY; LOGIC DEVICES; MATHEMATICAL MODELS;

DESIGN FOR MANUFACTURABILITY (DFM); OPTICAL PROXIMITY CORRECTION (OPC); RESOLUTION ENHANCEMENT TECHNIQUE (RET); SEMICONDUCTOR INDUSTRY;

LOGIC DESIGN;

EID: 2942633395     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.537655     Document Type: Conference Paper

References (11)

1. K. Lucas et. al. Proc. of SPIE Vol. 5040, 2003.
2. http://www.itrs.net/public
3. R. Radojcic, M. Rencher. EEtimes, DFY. http://img.cmpnet.com/eedesign/ 2003/inside_eedesign5.pdf
4. J. Sawicki. DFM: magic bullet or marketing hype? Proc. of SPIE Vol. 5379, 2004, to be published.
5. W. Grobman et. al. Proc. of the Design Automation Conference, 2001.
6. S. Shultze, J. Word. Proc. of SPIE Vol. 5379, 2004, to be published.
7. W. B. Shieh et. al. Proc. of SPIE Vol. 5377, 2004, to be published.
8. Krautshik et. al. Proc. of SPIE Vol. 4688, 2002.
9. J. Cobb et. al. Proc. of Electron, Ion, Photon Beam Technology and Nanofabrication Symp., 2003.
10. G. Vandenberghe, et. al, Proc. of SPIE, Vol. 5377, 2004, to be published.
11. H. Chuang et. al. Proc. of IEDM, pp: 483,486. 1997.