Genetic Algorithm based semiconductor manufacturing process controller for chemical mechanical planarization

Journal of the Chinese Institute of Industrial Engineers

Volumn 20, Issue 6, 2003, Pages 625-635

  Yeh, Jinn Yi ^a   Huang, Bau Hsien ^a  

^a DA YEH UNIVERSITY   (Taiwan)

Author keywords

Chemical mechanical planarization; Real valued genetic algorithm; Run to run controller

Indexed keywords

COMPUTER SIMULATION; GENETIC ALGORITHMS; LEAST SQUARES APPROXIMATIONS; MATHEMATICAL MODELS; PARAMETER ESTIMATION; SEMICONDUCTOR MATERIALS; TRANSFER FUNCTIONS;

CHEMICAL MECHANICAL PLANARIZATION; GENETIC ALGORITHM QUALITY CONTROLLER (GAQC); MULTIPLE INPUT-MULTIPLE OUTPUT (MIMO) CONTROLLER; REAL-VALUED GENETIC ALGORITHM; RUN-TO-RUN CONTROLLER;

PROCESS CONTROL;

EID: 24644454674     PISSN: 10170669     EISSN: None     Source Type: Journal    
DOI: 10.1080/10170660309509265     Document Type: Article

References (19)

1. Adewuya, A., New Methods in Genetic Search with Real-valued Chromosomes, Master's Thesis, Mechanical Engineering Department, Massachusetts Institute of Technology, Cambridge, MA (1996).
2. Boning, D., W. Moyne, T. Smith, J. Moyne and A. Hurwitz, "Practical issues in run by run process control," ASMC 95 Proceedings, 201-208 (1995).
3. Butler, S. W. and J. A. Stefani, "Supervisory run-to-run control of a polysilicon gate etch using in situ ellipsometry," IEEE Transactions on Semiconductor Manufacturing, 7(2), 193-201 (1994).
4. Clarke, D. W. and P. J. Gawthrop, "Self tuning controller, " Proc. IEE, 122(9), 929-935 (1975).
5. Del Castillo, E., "A multivariate self-tuning controller for run-to-run process control under shift and trend disturbances," IIE Transaction, 28(12), 1011-1021 (1996).
6. Del Castillo, E. and A. M. Hurwitz, "Run to run process: a literature review and some extensions," Journal of Quality Technology, 29(2), 184-196 (1997).
7. Del Castillo, E. and J. Yeh, "An adaptive run-to-run optimizing controller for linear and nonlinear semiconductor processes," IEEE Transactions on Semiconductor Manufacturing, 11(2), 285-295 (1998).
8. Edgar, T. F., W. J. Campbell and C. Bode, "Model-based control in microelectronics manufacturing," IEEE Conference on Decision and Control, 4, 4185-4191 (1999).
9. Goldberg, D. E., Genetic Algorithms, in Search, Optimization, and Machine Learning, Addison-Wesley, Mass (1989).
10. Guo, R., A. Chen and J. Chen, "Run-to-run control schemes for CMP process subject to deterministic drifts," Semiconductor Manufacturing Technology Workshop, 251-258 (2000).
11. Hankinson, M., T. Vincent, K. B. Irani and P. P. Khargonekar, "Integrated real-time and run-to-run control of etch depth in reactive ion etching," IEEE Transactions on Semiconductor Manufacturing, 10(1), 121-130 (1997).
12. Haupt, R. L. and S. E. Haupt, Practical Genetic Algorithms. Wiley Interscience Publication, NY (1998).
13. Hu, A., D. He, S. Wong, P. Renteln and E. Sachs, "Application of run by run controller to the chemical-mechanical planarization process II," Electronics Manufacturing Technology Symposium, 1, 371-378 (1994).
14. Hu, A., E. Sachs, A. Ingolfsson and P. Langer, "Run-by-run process control: performance benchmarks," IEEE/SEMI International Semiconductor Manufacturing Science Symposium, 73-78 (1992).
15. Ingolfsson, A. and E. Sacha, "Stability and sensitivity of an EWMA controller," Journal of Quality Technology, 25(4), 271-287 (1993).
16. Man, K. F., K. S. Tang and S. Kwong, Genetic Algorithms, Springer, Verlag, London (1999).
17. Moyne, J., E. Del Castillo and A. M. Hurwitz, Run-to-run control in semiconductor manufacturing, CRC, Florida (2001).
18. Sachs, E., A. Hu and A. Ingolfsson, "Run by run process control: combining SPC and feedback control," IEEE Transactions on Semiconductor Manufacturing, 8(1), 26-43 (1995).