Run-to-run control schemes for CMP process subject to deterministic drifts

2000 Semiconductor Manufacturing Technology Workshop

Volumn , Issue , 2000, Pages 251-258

  Guo, Ruey Shan ^a   Chen, Argon ^b   Chen, Jin Jung ^a  

^a NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^b NATIONAL TAIWAN UNIVERSITY   (Taiwan)

Author keywords

drift; EWMA; run to run control

Indexed keywords

CHEMICAL MECHANICAL POLISHING; CHEMICAL POLISHING; MANUFACTURE; POLISHING; SEMICONDUCTOR DEVICE MANUFACTURE;

CHEMICAL-MECHANICAL POLISHING PROCESS; CONTROL EFFECTIVENESS; CONTROL PERFORMANCE; DRIFT; EWMA; EXPONENTIALLY WEIGHTED MOVING AVERAGE; PREDICTOR CORRECTOR; RUN-TO-RUN CONTROL;

PROCESS CONTROL;

EID: 84963757762     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/SMTW.2000.883103     Document Type: Conference Paper

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