Transport mechanism of self-assembled D-σ-A-thiol monolayers in metal-molecule-metal structure

Synthetic Metals

Volumn 152, Issue 1-3, 2005, Pages 293-296

  Kim, Do Hyun ^a   Lee, Hyoyoung ^a   Zyoung, Taehyoung ^a  

^a Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

Author keywords

Heterojunctions; Organic semiconductor based on conjugated molecules; Self assembly using surface chemistry

Indexed keywords

ELECTRON TUNNELING; ELECTRONS; HETEROJUNCTIONS; MOLECULES; SELF ASSEMBLY; SEMICONDUCTING ORGANIC COMPOUNDS; SURFACE CHEMISTRY;

BARRIER HEIGHT; ORGANIC SEMICONDUCTORS BASED ON CONJUGATED MOLECCULES; SELF-ASSEMBLY USING SURFACE CHEMISTRY;

MONOLAYERS;

EID: 24644449331     PISSN: 03796779     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.synthmet.2005.07.160     Document Type: Conference Paper

References (20)

1. R.M. Metzger, B. Chen, U. Höpfner, M.V. Lakshmikantham, D. Vuillaume, T. Kawai, X. Wu, H. Tachibana, T.V. Hughes, H. Sakurai, J.W. Baldwin, C. Hosch, M.P. Cava, L. Brehmer, and G.J. Ashwell J. Am. Chem. Soc. 119 1997 10455
2. C. Zhou, M.R. Deshpande, M.A. Reed, L. Jones II, and J.M. Tour Appl. Phys. Lett. 71 1997 611
3. J. Chen, M.A. Reed, A.M. Rawlett, and J.M. Tour Science 286 1999 1550
4. J. Chen, W. Wang, M.A. Reed, A.M. Rawlett, D.W. Price, and J.M. Tour Appl. Phys. Lett. 77 2000 1224
5. C.P. Collier, G. Mattersteig, E.W. Wong, Y. Luo, K. Beverly, J. Sampaio, F.M. Raymo, J.F. Stoddart, and J.R. Heath Science 289 2000 1172
6. M.A. Reed, J. Chen, A.M. Rawlett, D.W. Price, and J.M. Tour Appl. Phys. Lett. 78 2001 3735
7. E.W. Wong, C.P. Collier, M. Beloradsky, F.M. Raymor, J.F. Stoddart, and J.R. Heath J. Am. Chem. Soc. 122 2000 5831
8. R.M. Metzger Acc. Chem. Res. 32 1999 950
9. C.P. Collier, E.W. Wong, M. Beloradsky, F.M. Raymor, J.F. Stoddard, P.J. Kuekes, R.S. Williams, and J.R. Heath Science 285 1999 391
10. M.A. Reed, C. Zhou, C.J. Muller, T.P. Burgin, and J.M. Tour Science 278 1997 252
11. J.G. Kushmerick, D.B. Holt, J.C. Yang, J. Naciri, M.H. Moore, and R. Shashidhar Phys. Rev. Lett. 89 2002 086802
12. W. Wang, T. Lee, and M.A. Reed Physica E 19 2003 117
13. W. Hu, H. Nakashima, K. Furukawa, Y. Kashimura, K. Ajito, C. Han, and K. Torimitsu Phys. Rew. B 69 2004 165207
14. W. Wang, T. Lee, and M.A. Reed Phys. Rev. B 68 2003 035416
15. Y. Sakata, and S. Misumi Bull. Chem. Soc. JPN. 56 1983 775
16. E.S. Pysh, and N.C. Yang J. Am. Chem. Soc. 85 1963 2124
17. E. Clar, J.M. Robertson, R. Schlogl, and W. Schmidt J. Am. Chem. Soc. 103 1981 1320
18. A. Musa, B. Sridharan, H. Lee, and D.L. Mattern J. Org. Chem. 61 1996 5481
19. A.C. Brady, B. Hodder, A.S. Martin, J.R. Sambles, C.P. Ewels, R. Jones, P.R. Briddon, A.M. Musa, C.A. Panetta, and D.L. Mattern J. Mater. Chem. 9 1999 2271
20. A. Dhirani, P.H. Lin, P. Guyot-Sionnest, R.W. Zehner, and L.R. Sita J. Chem. Phys. 106 1997 5249