Stress profiles and thermal stability of CrxNy films deposited by magnetron sputtering

Surface and Coatings Technology

Volumn 151-152, Issue , 2002, Pages 510-514

  Djouadi, M A ^a,b   Nouveau, C ^a   Banakh, O ^b   Sanjines R ^b   Levy F ^b   Nouet, G ^c  

^a ARTS ET MÉTIERS PARISTECH   (France)

^b EPFL   (Switzerland)

^c LERMAT Laboratoire d'Etude et de Recherche sur les Materiaux   (France)

Author keywords

Chromium nitride; Stress profiles; Thermal stability

Indexed keywords

ADHESION; ANNEALING; CHROMIUM COMPOUNDS; COMPRESSIVE STRESS; MAGNETRON SPUTTERING; NITROGEN; THERMODYNAMIC STABILITY;

POST DEPOSITION ANNEALING; STRUCTURAL PROPERTIES;

METALLIC FILMS;

CHROMIUM NITRIDE; FILM; SPUTTERING; STRESS;

EID: 0036497014     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(01)01635-8     Document Type: Article

References (10)