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Volumn 398, Issue 399, 2001, Pages 490-495

Stress and structure profiles for chromium nitride coatings deposited by r.f. magnetron sputtering

Author keywords

Chromium nitride; r.f. magnetron sputtering; Stress profiles

Indexed keywords

CHROMATE COATINGS; CHROMIUM COMPOUNDS; COMPRESSIVE STRESS; CRYSTAL MICROSTRUCTURE; CRYSTALLINE MATERIALS; DEPOSITION; ENERGY DISPERSIVE SPECTROSCOPY; MAGNETRON SPUTTERING; SCANNING ELECTRON MICROSCOPY; SCANNING TUNNELING MICROSCOPY; SEMICONDUCTING SILICON; SUBSTRATES; WAVELENGTH DISPERSIVE SPECTROSCOPY; X RAY DIFFRACTION ANALYSIS;

EID: 18244412509     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(01)01435-3     Document Type: Article
Times cited : (50)

References (12)
  • 7
    • 84992287744 scopus 로고    scopus 로고
    • PhD Thesis of Ecole Polytechnique de Lausanne
    • (2000)
    • Hones, P.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.