The use of diffraction and phase X-ray contrast in study of materials

Crystallography Reports

Volumn 49, Issue SUPPL. 1, 2004, Pages

  Argunova, T S ^a   Sorokin, L M ^a   Kostina, L S ^a   Je, J H ^b   Gutkin, M Y ^c   Sheinerman, A G ^c  

^a IOFFE INSTITUTE   (Russian Federation)

^b Pohang University of Science and Technology (POSTECH)   (South Korea)

^c INSTITUTE OF PROBLEMS OF MECHANICAL ENGINEERING   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRONIC EQUIPMENT; SEMICONDUCTING SILICON; SYNCHROTRON RADIATION; X RAY DIFFRACTION ANALYSIS;

CRYSTAL-SEED INTERFACES; FRESNEL DIFFRACTION; SYNCHROTRON X-RAY RADIATION; X-RAY CONSTRAST;

MATERIALS SCIENCE;

EID: 24644434375     PISSN: 10637745     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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