Characterisation of ultra-thin III/V-heterostructures by convergent-beam-electron- and high-resolution-X-ray-diffraction

Materials Science and Engineering: B

Volumn 110, Issue 2, 2004, Pages 161-167

  Schulze Kraasch, F ^a   Velling, P ^a   Neumann, S ^a   Prost, W ^a  

^a UNIVERSITY OF DUISBURG ESSEN   (Germany)

Author keywords

Convergent electron beam diffraction; High resolution X ray diffraction; III V Heterostrucutures; Metal organic vapour phase epitaxy

Indexed keywords

ABERRATIONS; CRYSTAL ORIENTATION; ELECTRON LENSES; ELECTRONS; MONOCHROMATORS; SEMICONDUCTING INDIUM COMPOUNDS; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY; VAPOR PHASE EPITAXY; X RAY DIFFRACTION;

CONVERGENT ELECTRON BEAM DIFFRACTION; HIGH RESOLUTION X RAY DIFFRACTION; SCANNING TRANSMISSION ELECTRON MICROSCOPY (STEM); SPHERICAL ABERRATION;

HETEROJUNCTIONS;

EID: 2442719312     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2004.01.021     Document Type: Article

References (17)

1. Capasso F., Sen S., Beltram F., Lunardi L.M., Vengurlekar A.S., Smith P.R., Shah N.J., Malik R.J., Cho A.Y. IEEE Trans. Electron Devices. 36(10):1989;2065-2082.
2. Lakner H., Mendorf C., Bollig B., Prost W., Tegude F.-J. Mater. Sci. Eng. B. 44(1-3):1997;52-56.
3. Bartels W.J., Nijman W. J. Cryst. Growth. 44:1978;518-525.
4. Twigg M.E., Chu S.N.G., Joy D.C., Maher D.M., Macrander A.T. J. Appl. Phys. 62(8):1987;3156-3160.
5. Zuo J.M. Ultramicroscopy. 41:1992;211-223.
6. F. Schulze-Kraasch, H. Lakner, Electron Microscopy 1998, Paper presented at ICEM-14, Symposium M, Vol. III, Cancun, Mexico, 31 August-4 September 1998, 781-782.
7. Lakner H., Bollig B., Ungerecht S., Kubalek E. J. Phys. D: Appl. Phys. 29:1996;1767-1778.
8. Veiling P., Agethen M., Prost W., Tegude F.J. J. Cryst. Growth. 221:2000;722-729.
9. P. Glösekötter, C. Pacha, K.F. Goser, W. Prost, S. Kim, H. van Husen, T. Reimann, F.J. Tegude, in: Proceedings of the 32nd European Solid-State Device Research Conference (ESSDERC), 2002, p. 211-14.
10. Kirkland E.J., Thomas M.G. Ultramicroscopy. 62:1996;79-88.
11. Haase M., Prost W., Velling P., Liu Q., Tegude F.J. Thin Solid Films. 319:1998;25-28.
12. Wu W., Skala S.I., Tucker J.R., Lyding J.W., Seabaugh A., Beam E.A. III, Jovanovic D. J. Vac. Sci. Technol. A. 13:1995;602-606.
13. 1-y-semiconductor heterostructures, published in Ch. Mendorf , PhD thesis, http://www.ub.uni- duisburg.de/diss/elecdiss.htm , Duisburg (2002) p. 46.
14. Cosslett V.E. OPTIK. 36(1):1972;85-92.
15. Treacy M.M.J., Gibson J.M., Howie A. Philos. Mag. A. 51(3):1985;194-202.
16. A. Radefeld, F. Schulze-Kraasch, H. Lakner, Electron Microscopy, Paper presented at ICEM-14, Symposium Y, Vol. II, Cancun, Mexico, 31 August - 4 September, 1998, pp. 649-650.
17. Zuo J.M., Spence J.C.H. Phil. Magazine A. 68:1993;1055-1078.