SCOPUS 정보 검색 플랫폼

Thin Solid Films

Volumn 398, Issue 399, 2001, Pages 17-23

Characterization of aluminum nitride thin films deposited by filtered cathodic arc process

(5) Dixit, S J a Rai, A K a Bhattacharya, R S a Guha, S b Wittberg, T c

a UES INC (United States)

b AIR FORCE RESEARCH LABORATORY (United States)

c UNIVERSITY OF DAYTON RESEARCH INSTITUTE (United States)

Author keywords

Aluminium nitride; Filtered arc process; Thin films

Indexed keywords

ALUMINUM NITRIDE; AUGER ELECTRON SPECTROSCOPY; CHEMICAL VAPOR DEPOSITION; CRYSTAL MICROSTRUCTURE; CRYSTALLINE MATERIALS; FILM GROWTH; GRAIN SIZE AND SHAPE; NANOSTRUCTURED MATERIALS; OPTICAL PROPERTIES; SEMICONDUCTING SILICON; STOICHIOMETRY; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY;

FILTERED CATHODIC ARC PROCESSES;

THIN FILMS;

EID: 0035506708 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(01)01297-4 Document Type: Article

Times cited : (8)

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