High energy ion characterization of sputtered AlN thin films

Diamond and Related Materials

Volumn 12, Issue 3-7, 2003, Pages 1157-1161

  Garcia Lopez J ^a   Morilla, Y ^a   Respaldiza, M A ^a   Clement, M ^b   Iborra, E ^b   Sanz Hervas, A ^b   Sangrador, J ^b  

^a CENTRO NACIONAL DE ACELERADORES   (Spain)

^b UNIVERSIDAD POLITÉCNICA DE MADRID   (Spain)

Author keywords

Aluminum nitride; Impurity characterization; Ion beam techniques; Sputtering

Indexed keywords

ALUMINUM NITRIDE; COMPOSITION; CRYSTAL DEFECTS; OPTICAL FILMS; POLYCRYSTALLINE MATERIALS; RUTHERFORD BACKSCATTERING SPECTROSCOPY;

SPUTTERING PRESSURE;

THIN FILMS;

DIAMOND;

EID: 0037508548     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(02)00306-0     Document Type: Article

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