X-ray reflectivity, photoelectron and nanoindentation studies of tetrahedral amorphous carbon (ta-C) films synthesized by double bend cathodic arc

Diamond and Related Materials

Volumn 13, Issue 4-8, 2004, Pages 1486-1490

  Abbas, G A ^a   Papakonstantinou, P ^a   McLaughlin, J A ^a  

^a UNIVERSITY OF ULSTER   (United Kingdom)

Author keywords

Cathodic arc discharge; Hardness; Surface characterization; Ta C

Indexed keywords

CARBON; CHEMICAL BONDS; COATINGS; SILICON; STRESS ANALYSIS; SUBSTRATES; SYNTHESIS (CHEMICAL); VOLTAGE CONTROL;

FILTERED VACUUM CATHODIC ARC (FCVA) SYSTEM; NANOINDENTATION; PHOTOELECTRONS; X-RAY REFLECTIVITY;

AMORPHOUS FILMS;

DIAMOND;

EID: 2442545313     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2003.11.087     Document Type: Article

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