Large-scale production techniques for photonic nanostructures

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5225, Issue , 2003, Pages 101-112

  Bogaerts, W ^a   Wiaux, V ^b   Dumon, P ^a   Taillaert, D ^a   Wouters, J ^b   Beckx, S ^b   Van Campenhout, J ^a   Luyssaert, Bert ^a   Van Thourhout, Dries ^a   Baets, R ^a  

^a GHENT UNIVERSITY   (Belgium)

^b IMEC   (Belgium)

Author keywords

Deep UV lithography; Nanophotonics; Photonic crystals

Indexed keywords

CMOS INTEGRATED CIRCUITS; COST EFFECTIVENESS; CRYSTALS; LIGHT POLARIZATION; LIGHT PROPAGATION; LITHOGRAPHY; OPTICAL FIBERS; OPTICAL WAVEGUIDES; PHOTONS; SIGNAL PROCESSING; SILICON; SILICON ON INSULATOR TECHNOLOGY; SURFACE ROUGHNESS;

DEEP UV LITHOGRAPHY; NANOPHOTONICS; PHOTONIC CRYSTALS;

NANOSTRUCTURED MATERIALS;

EID: 3142678314     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.503665     Document Type: Conference Paper

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