Hard coating adhesion on ion implanted polymer surfaces

Thin Solid Films

Volumn 377-378, Issue , 2000, Pages 760-765

  Guzman, L ^a   Miotello, A ^a   Voltolini, E ^b   Adami, M ^a  

^a UNIVERSITY OF TRENTO   (Italy)

^b FONDAZIONE BRUNO KESSLER   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; CHEMICAL RESISTANCE; HARDNESS; ION IMPLANTATION; METALLIZING; SURFACE TREATMENT; VAPOR DEPOSITION; WEAR RESISTANCE;

HARD COATINGS;

METALLIC FILMS;

EID: 0034507398     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01330-4     Document Type: Article

References (18)

1. Kroetz R. Metalloberflaeche. 45:1991;345.
2. Fessmann J. Surf. Coat. Technol. 54/55:1992;599.
3. Haag C., Suhr H. Appl. Phys. A47:1988;199.
4. Weber A. J. Electrochem. Soc. 144:1997;1131.
5. Lee E.H., Rao G.R., Lewis M.B., Mansur L.K. Nucl. Instr. Meth. B74:1993;326.
6. Sofield C.J., Sugden S., Ing J., Bridwell I.B., Ing J., Bridwell I.B., Wang Y.Q. Vacuum. 44:1993;285.
7. Rao G.R., Monar K., Lee E.H., Treglio J.R. Surf. Coat. Technol. 64:1994;69.
8. Guzman L., Celva R., Miotello A., Voltolini E., Ferrari F., Adami M. Surf. Coat. Technol. 103:1998;376.
9. Awazu K., Yoshida H., Watanabe H., Iwaki M., Guzman L. Surf. Coat. Technol. 51:1992;509.
10. Guzman L., Scotoni I., Miotello A., Elena M., Kothari D.C. Nucl. Instr. Meth. B. 80/81:1993;1097.
11. Fletcher R., Powell M.J.D. Comput. J. 6:1963;163.
12. Gissler W., Haupt J., Gibson P.N., Sasaki T., Guzman L., Elena M., Moro L. Sudarshan T.S. Surf. Modif. Technol. VII. 1994;571 The Inst. of Metals, London.
13. Pivin J.C. Nucl. Instr. Meth. B. 84:1994;484.
14. McGregor W.J. Elements of Mechanical Metallurgy. 1966;91 Tegart-McMilliam, New York.
15. Wada T., Takeno A., Iwaki M., Sasabe H. Synth. Met. 18:1987;585.
16. Lee E.H., Rao G.R., Lewis M.B., Mansur L.K. J. Mater. Res. 9:1994;1043.
17. Rao G.R., Monar K., Lee E.H., Treglio J.R. Surf. Coat. Technol. 64:1994;69.
18. Svorcik V., Rybka V., Volka V., Hnatowicz V., Kvítek J., Seidl P. Jpn. J. Appl. Phys. 31:1992;L287.