The beam blanking system for microlithography at Lund Nuclear Microprobe

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 219-220, Issue 1-4, 2004, Pages 485-489

  Auzelyte, Vaida ^a   Elfman, Mikael ^a   Kristiansson, Per ^a   Malmqvist, Klas ^a   Wallman, Lars ^a   Nilsson, Christer ^a   Pallon, Jan ^a   Shariff, Asad ^a   Wegdén, Marie ^a  

^a LUND INSTITUTE OF TECHNOLOGY   (Sweden)

Author keywords

Beam blanking; Beam control; Ion beam lithography; Micromachining; Proton beam lithography

Indexed keywords

ELECTRIC GENERATORS; ELECTRIC POTENTIAL; ION BEAMS; MATHEMATICAL MODELS; MICROMACHINING; MICROSTRUCTURE; PARTICLE ACCELERATORS; POLYMERS; SEMICONDUCTOR MATERIALS;

BEAM BLANKING; BEAM CONTROL; PROTON BEAM LITHOGRAPHY;

ION BEAM LITHOGRAPHY;

EID: 2442430210     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2004.01.107     Document Type: Conference Paper

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