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Volumn E88-C, Issue 5, 2005, Pages 788-794
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Design guidelines and process quality improvement for treatment of device variations in an LSI chip
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Author keywords
Correlation length; Fitting function; Random variation; Systematic variation; Within die parameter variation
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Indexed keywords
ELECTRIC RESISTANCE;
LEAST SQUARES APPROXIMATIONS;
MICROPROCESSOR CHIPS;
POLYNOMIALS;
POLYSILICON;
QUALITY CONTROL;
RANDOM PROCESSES;
TRANSISTORS;
CORRELATION LENGTH;
FITTING FUNCTION;
RANDOM VARIATIONS;
SYSTEMATIC VARIATIONS;
WITHIN-DIE PARAMETER VARIATIONS;
LSI CIRCUITS;
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EID: 24144464519
PISSN: 09168524
EISSN: None
Source Type: Journal
DOI: 10.1093/ietele/e88-c.5.788 Document Type: Conference Paper |
Times cited : (12)
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References (8)
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