Non-resonant, electrode-less method for measuring the microwave complex permittivity of ferroelectric thin films

Measurement Science and Technology

Volumn 16, Issue 9, 2005, Pages 1792-1797

  Kim, Beomjin ^a   Kazmirenko, Victor ^b   Prokopenko, Yuriy ^b   Poplavko, Yuriy ^b   Baik, Sunggi ^a  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

^b NATIONAL TECHNICAL UNIVERSITY OF UKRAINE   (Ukraine)

Author keywords

Ferroelectric thin film; Microwave complex permittivity; Partially filled waveguide; Scattering parameters

Indexed keywords

DEPOSITION; ELECTRIC NETWORK ANALYZERS; ELECTRODES; NUMERICAL ANALYSIS; PERMITTIVITY; SCATTERING PARAMETERS; VECTORS; WAVEGUIDES;

COMPLEX PERMITTIVITY; DIELECTRIC THIN FILMS; MICROWAVE COMPLEX PERMITTIVITY; PARTIALLY FILLED WAVEGUIDES;

FERROELECTRIC THIN FILMS;

FILM THICKNESS;

EID: 24144461302     PISSN: 09570233     EISSN: 09570233     Source Type: Journal    
DOI: 10.1088/0957-0233/16/9/011     Document Type: Article

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